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【ASML EUV微影設備｜雙晶圓平台處理技術⚙️】 ASML TWINSCAN曝光機中的晶圓平台（Wafer Stage）是微影設備中關鍵的定位模組（Positioning Module），在系統設計上整合機械電子學、光學設計及量測學（包含量測、數據處理及控制）。雙晶圓平台能在同一時間移動兩片矽晶圓：其中右邊的晶圓曝光於EUV極紫外光下，將電路設計圖影像（Pattern）刻在晶圓上；左邊的晶圓同時由機台的量測儀器優化其準確度（Alignment）。兩個平台交替執行微影和量測功能，並以電磁的方式移動，在無摩擦力的作用下能加速至7G❗️ 這就是ASML的微影系統如何在晶片量產時得以兼顧準確性及生產速度的關鍵。⚡️ #ASML #EUV #WaferStage | ASML
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